The Open Crystallography Journal

2009, 2 : 11-14
Published online 2009 May 7. DOI: 10.2174/1874846500902010011
Publisher ID: TOCRYJ-2-11

The Influence of Hydrogen Gas Treatment on the Characteristics of ZnO Films

Lung-Chien Chen and Ching-Ho Tien
Department of Electro-optical Engineering, National Taipei University of Technology, 1, sec.3, ChungHsiao E. Rd., Taipei 106, Taiwan, Republic of China.

ABSTRACT

This study presents a zinc oxide (ZnO) film deposited on a glass substrate by ultrasonic spraying pyrolysis. The ZnO nanostructure was formed by treating the as-deposited ZnO films with hydrogen. The root-mean-square (RMS) roughness increases from 5.83 nm to 12.53 nm during the treatment for 20 min, but slightly decreases to 11.87 nm at a treatment time of 30 min. In the range 400-500 nm, the transparency of all the films with hydrogen treatment is slightly lower than that of the untreated films. The slight drop in the transparency of the films with hydrogen treatment is caused by scattering from pin-holes or nanostructures on the surface.

Keywords:

Zinc oxide, hydrogen gas treatment, ultrasonic spraying pyrolysis.