The Open Electrical & Electronic Engineering Journal

2010, 4 : 1-9
Published online 2010 January 5. DOI: 10.2174/1874129001004010001
Publisher ID: TOEEJ-4-1

Advances in Group-III-Nitride Photodetectors

Carlos Rivera , Juan Pereiro , Alvaro Navarro , Elias Munoz , Oliver Brandt and Holger T. Grahn
ISOM and Dpto. Ingenieria Electronica, ETSI Telecomunicacion, Universidad Politecnica de Madrid, Ciudad Universitaria, 28040 Madrid, Spain.

ABSTRACT

Group-III nitrides are considered to be a strategic technology for the development of ultraviolet photodetectors due to their remarkable properties in terms of spectral selectivity, radiation hardness, and noise. The potential advantages of these materials were initially obscured by their large density of intrinsic defects. The advances were thus associated in general with improvements in material quality. Although technology still also needs improvement, efforts are being intensified in the fabrication of advanced structures for photodetector applications. In particular, this review discusses the recent progress in group-III-nitride photodetectors, emphasizing the work reported on quantum-well-based photodetectors, the use of novel structures exploiting the effect of piezoelectric polarization-induced fields, and polarization-sensitive photodetectors. Furthermore, some ideas can be generalized to other material systems such as ZnO and their related compounds, which exhibit the same crystal structure as group-III nitrides.