The Open Inorganic Chemistry Journal

2008, 2 : 11-17
Published online 2008 February 6. DOI: 10.2174/1874098700802010011
Publisher ID: TOICJ-2-11

Synthesis and Characterization of Ruthenium Amidinate Complexes as Precursors for Vapor Deposition

Huazhi Li , Titta Aaltonen , Zhengwen Li , Booyong S. Lim and Roy G. Gordon
Department of Chemistry and Chemical Biology, Harvard University, Cambridge, Massachusetts 02138, USA.

ABSTRACT

Three new ruthenium amidinate complexes were prepared: tris(diisopropylacetamidinato)-ruthenium(III), Ru(iPrNC(Me)NiPr)3 4; bis(diisopropyl-acetamidinato)ruthenium(II) dicarbonyl, Ru(iPrNC(Me)NiPr)2(CO)2 5; and bis(ditert- butylacetamidinato)ruthenium(II) dicarbonyl, Ru(tBuNC(Me)NtBu)2(CO)2 6. They have been synthesized and characterized by 1H NMR, TG and X-ray structure analysis. These three complexes were found to be monomeric and air stable. Compound 6 was found to have sufficient volatility and thermal stability for use in chemical vapor deposition (CVD) and atomic layer deposition (ALD) of ruthenium metal films.

Keywords:

Ruthenium, amidinate, ALD.